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"Thin-film fabrication process"

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Fabrication of Yttria and Zirconia Co-sputtering Cathode Functional Layer for Low Temperature Solid Oxide Fuel Cells
Taehyeon Lee, Seungbong Oh, Davin Jeong, Soonwook Hong
J. Korean Soc. Precis. Eng. 2025;42(12):997-1002.
Published online December 1, 2025
DOI: https://doi.org/10.7736/JKSPE.025.00013
A yttria-stabilized zirconia (YSZ) cathode functional layer (CFL) was fabricated using a co-sputtering process to improve the oxygen reduction reaction (ORR) in solid oxide fuel cells (SOFCs). To optimize the yttria molar percentage and achieve a nano-granular structure with enhanced grain boundary density, the DC sputtering power for the metallic yttrium target was varied at 10, 30, and 50 W. Structural and compositional analyses were performed using scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and X-ray diffraction (XRD). The results indicated that a DC power of 30 W resulted in a well-developed grain structure with high grain boundary density and an yttria composition close to the optimal molar percentage of 8-10 mol %. Under these optimized conditions, the SOFC with the co-sputtered YSZ CFL achieved a maximum power output of 9.22 mW/cm² at 450oC, representing approximately a 43% enhancement compared to the reference cell. This highlights the significant potential of co-sputtering for future low-temperature SOFC applications.
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Cathodic Functional Layer via Sputtering and Atomic Layer Deposition for Thin-Film Solid Oxide Fuel Cells
Jaeyoon Lee, Sanghyeok Lee, Hyeontaek Kim, Yongchan Park, Geunjin Lee, Changheon Lee, Sunggyu Choi, Soonwook Hong
J. Korean Soc. Precis. Eng. 2022;39(2):97-102.
Published online February 1, 2022
DOI: https://doi.org/10.7736/JKSPE.021.123
In this study, Yttria-stabilized zirconia (YSZ) functional layers were applied with different thin-film fabrication process such as sputtering and atomic layer deposition (ALD) to enhance oxygen reduction reaction (ORR) for solid oxide fuel cells. We confirmed that the YSZ functional layer deposited with sputtering showed relatively low grain boundary density, while the YSZ functional layer deposited with the ALD technique clearly indicated high grain boundary density through scanning electron microscopy (SEM) and X-ray diffractometry (XRD) results. The YSZ functional layer coated with the ALD technique revealed that more ORR kinetics can occur using high grain boundary density than the functional layer deposited with sputtering. The peak power density of the SOFC deposited with ALD YSZ indicates 2-folds enhancement than the pristine SOFC.
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