Skip to main navigation Skip to main content
  • E-Submission

JKSPE : Journal of the Korean Society for Precision Engineering

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS
Article

상압 플라즈마를 이용한 반도체 공정에서의 배출가스 처리기술

송영훈, 김용진

Atmospheric Pressure Plasma Applications to Treat Off-Gases from Semiconductor Manufacturing

Young Hoon Song, Yong Jin Kim
JKSPE 2002;19(8):34-37.
Published online: August 1, 2002
  • 6 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Atmospheric Pressure Plasma Applications to Treat Off-Gases from Semiconductor Manufacturing
J. Korean Soc. Precis. Eng.. 2002;19(8):34-37.   Published online August 1, 2002
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Atmospheric Pressure Plasma Applications to Treat Off-Gases from Semiconductor Manufacturing
J. Korean Soc. Precis. Eng.. 2002;19(8):34-37.   Published online August 1, 2002
Close