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수직 원통형 CVD 반응로에서 박막의 균일성과 증착률 최적화에 대한 수치해석적 연구

김종희, 김홍제, 오성모, 이건휘, 이봉구

Numerical Analysis for Optimization of Film Uniformity and Deposition Grow Rate in the Vertical Cylindric Reactor

Jong Hee Kim, Hong Je Kim, Seong Mo Oh, Gun Hyee Lee, Bong Goo Rhee
JKSPE 2002;19(8):92-99.
Published online: August 1, 2002



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Numerical Analysis for Optimization of Film Uniformity and Deposition Grow Rate in the Vertical Cylindric Reactor
J. Korean Soc. Precis. Eng.. 2002;19(8):92-99.   Published online August 1, 2002
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Numerical Analysis for Optimization of Film Uniformity and Deposition Grow Rate in the Vertical Cylindric Reactor
J. Korean Soc. Precis. Eng.. 2002;19(8):92-99.   Published online August 1, 2002
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