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스퍼터 공정을 통한 LT-SOFC의 PrOx Capping Layer의 전기화학적 특성 평가

Electrochemical Evaluation of PrOx Capping Layer in LT-SOFCs via Sputtering Process

Journal of the Korean Society for Precision Engineering 2025;42(12):1003-1010.
Published online: December 1, 2025

1단국대학교 기계공학과

1Department of Mechanical Engineering, Dankook University

#Corresponding Author / E-mail: guyoungcho@dankook.ac.kr, TEL: +82-31-8005-3520
• Received: August 27, 2025   • Revised: October 12, 2025   • Accepted: October 19, 2025

Copyright © The Korean Society for Precision Engineering

This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0/) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.

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  • Solid Oxide Fuel Cells (SOFCs) are energy conversion devices known for their significantly higher power density compared to other fuel cell types. However, their high operating temperatures pose challenges related to thermal stability. To address this, research is focusing on Low-Temperature SOFCs (LT-SOFCs), which function at lower temperatures and exhibit enhanced electrochemical performance. While various electrode materials are utilized in SOFCs, platinum (Pt) stands out for its excellent electronic conductivity and catalytic activity. Unfortunately, at the operating temperatures of SOFCs, Pt tends to agglomerate, leading to a rapid reduction in the triple phase boundary (TPB) and a subsequent decline in electrochemical reactions. In this study, LT-SOFCs were fabricated with a Praseodymium Oxide (PrOx) capping layer applied to a porous Pt cathode using sputtering, with various thicknesses achieved by adjusting the deposition time. The electrochemical performance of the LT-SOFCs was measured at 500oC. Additionally, the degradation behavior of the LT-SOFCs was assessed by applying a constant voltage of 0.5 V for 48 hours. Scanning Electron Microscopy (SEM) analysis was also conducted on the PrOx capping layer thin films under the same operating conditions.
Fuel cells are devices that convert chemical energy into electrical energy and are receiving significant attention today, where environmental issues are emphasized. Among them, Solid Oxide Fuel Cells (SOFCs) are known as devices with excellent thermal efficiency [1-4]. However, due to the high-temperature operating environment, SOFCs still have many issues to be addressed in terms of material selection and long-term stability [5-7]. In particular, if the operating temperature of conventional SOFCs is simply lowered, the electrochemical performance drops significantly.
Therefore, research on LT-SOFCs (Low-temperature SOFCs), which lower the operating temperature to below 600oC and enhance electrochemical performance, is being conducted. In various previous studies, perovskite materials which are mixed-ionic electron conductors, have already been applied to the electrodes of LT-SOFCs and have shown excellent performance even at the relatively low operating temperature of below 600oC [8-12]. Meanwhile, Pt is the promising cathode materials in LTSOFCs. On the Pt surface, oxygen molecules (O2) can dissociate into atomic oxygen (O) with a relatively low energy barrier [13]. In addition, due to its high electrical conductivity, Pt enables efficient electron transfer required for the oxygen reduction reaction (ORR) [7,14-15]. According to previous studies, Pt exhibits excellent ORR activity even at low temperatures below 500oC [13,16]. However, Pt easily undergoes agglomeration at the operating temperature of SOFCs. Agglomeration is a phenomenon that occurs when thermal energy is applied to a Pt film or nanoparticles, causing Pt atoms or clusters to migrate toward regions of lower surface energy [17,18]. This reduces the triple phase boundary (TPB), thereby decreasing the effective area available for electrochemical reactions and ultimately leading to a drop in cell performance. Furthermore, as Pt particles undergo agglomeration, the originally continuous conductive pathways break down into a discontinuous network of isolated particles [19]. This disrupts electron transport within the electrode, and further degrades the overall operational efficiency of the cell.
Accordingly, the cathode capping layer is a thinly coated layer on the top of the cathode that helps improve electrochemical performance by enhancing catalytic activity and reducing interfacial resistance. According to previous research by Ji, alumina capping agents fabricated through the atomic layer deposition (ALD) process showed lower ohmic resistance than Pt cathodes [20]. In addition, Liu applied a ZrO₂ capping layer to nanoporous Pt cathodes and analyzed the thermal stability and polarization resistance changes [21]. Furthermore, according to previous research by Hong, the electrochemical performance was improved by fabricating a capping layer of GDC through a sputtering process [22].
Praseodymium oxide (PrOx) is an oxide containing the rareearth element Pr, characterized by the coexistence of various oxidation states such as Pr3+ and Pr4+ [23-25]. In particular, due to the mixed valence state of PrOx, it exhibits MIEC properties, allowing both electronic conduction and ionic conduction through oxygen vacancies [26]. It also has excellent oxygen storage capacity (OSC), enabling free storage and release of oxygen ions. Due to these reasons, PrOx exhibits outstanding catalytic activity [27,28]. Moreover, it has been previously reported that the addition of Pr6O11 to LSM facilitates oxygen ion transport by creating new ion conduction channels and expanding active reaction sites, which in turn leads to a substantial reduction in polarization loss [29]. However, there has been no research on capping layers fabrication of PrOx using the PVD process. In this study, a PrOx capping layer will be fabricated using the sputtering process, and the electrochemical performance of LT-SOFCs will be evaluated accordingly.
As shown in Fig. 1, reaction area of 1 mm2 LT-SOFCs was fabricated. A 180 μm-thick Sc₂O₃-stabilized zirconia (ScSZ) pellet was used as the electrolyte support. ScSZ possesses excellent mechanical strength and shows the highest oxygen ion conductivity [2,7,30]. Additionally, all electrodes and capping layer were fabricated by sputtering (KVS-2000L, Korea Vacuum Tech, Gimpo-si, Republic of Korea). Sputtering offers the advantage of enabling deposition technique within cost and efficiency [31]. The cathode was deposited using a Pt target (VTM, Incheon, Republic of Korea). Porous Pt was deposited for 5 minutes at a DC power of 100 W, with an Ar gas flow rate of 30 sccm supplied under a pressure of 50 mTorr. The anode was deposited using a Ni target (VTM, Incheon, Republic of Korea). Ni has high electrical conductivity and excellent catalytic properties for the Hydrogen Oxidation Reaction (HOR). Ni was deposited by applying a DC power of 100 W, with an Ar gas flow rate of 30 sccm, under a working pressure of 30 mTorr. The parameters for electrode fabrication are shown in Table 1, under the same conditions as the previous study [7].
The PrOx layer was deposited using a Pr6O11 target (VTM, Incheon, Republic of Korea) via a reactive sputtering process. Although reactive sputtering has the disadvantage of a low deposition rate, it offers the advantage of achieving excellent uniformity in oxide thin films. The deposition process for PrOx was based on previous study, and was carried out under a process pressure of 5 mTorr by supplying Ar gas at 24 sccm and O2 gas at 6 sccm into the chamber, with an RF power of 40 W applied. In our previous work, the PrOx thin film deposited for 1 hour was identified to have a thickness of approximately 30 nm through SEM analysis, corresponding to a deposition rate of 0.5 nm/min [7]. The films were deposited for various durations. The PrOx layers were subdivided based on PrOx deposition time, as shown in Table 2.
Additionally, thin films identical to the LT-SOFCs cathode were deposited on a Si wafer, and annealing was performed at 500oC for 48 hours. Subsequently, Scanning Electron Microscopy (SEM) was conducted to examine the surface behavior of both the as-deposited and annealed cases.
To investigate the electrochemical performance of LT-SOFCs, custom-made SOFC test station setup was used, as shown in Fig. 3. Each electrode was connected by Ag wire and Ag paste (Silver Conductive Ink Liquid S-020, Alfa Aesar, Haverhill, MA, USA). After connecting the Ag paste, the sample was heat-treated at 200oC for 1 hour in air to ensure electrical conductivity between the cell and the wire. To prevent gas leakage, ceramic sealant (Ceramabond 571, Aremco, Valley Cottage, NY, USA) was used. Cell tests were conducted at 500oC. Hydrogen gas (H2) was supplied at a flow rate of 50 sccm at 1.2 bar by mass flow controller. On the other hand, the cathode was exposed to atmosphere. Electrochemical properties were measured using potentiostat (SP-300, Biologic, Seyssinet-Pariset, France). After measurements of the cell performance, electrochemical impedance spectroscopy (EIS) was analyzed by applying an alternating current perturbation of 10 mV at 0.7 V over a frequency range of 1 Hz to 1 MHz. In addition, to evaluate the thermal stability of the LT-SOFCs, the current density was measured under a constant voltage of 0.5 V for 48 hours.
3.1 Analysis of Pt Cathode with PrOx Capping Layer
Fig. 3 shows differentiated PrOx capping layers according to deposition time, as well as the results for the as-deposited samples and those annealed for 48 hours. During the SEM analysis of the PrOx capping layer deposited on the 150 nm-thick Pt cathode, no additional Pt coating was applied in order to avoid distortion of the uniformity of layers. Fig. 3(a) shows the pure Pt case without the PrOx capping layer. Figs. 3(b) is the case where PrOx layer was deposited for 5 minutes, 3(c) for 10 minutes, 3(d) for 20 minutes, 3(e) is the case where PrOx was deposited for 60 minutes. In addition, Figs. 3(f)-3(j) correspond to the cases in 3(a)-3(e) after annealing at 500oC for 48 hours.
In the case of pure Pt, where no PrOx was deposited, it is visually evident that the particle size increases after annealing at 500oC for 48 hours compared to the as-deposited state. This observation is consistent with previous studies, which have reported similar tendencies for particle growth under comparable temperature conditions [17-21]. As the particle size increases after annealing, the electrochemically active surface area (ECSA) of the catalyst decreases, and the TPB density is reduced [32].
Consequently, this leads to a deterioration in electrochemical performance. Figs. 3(b) and 3(f) correspond to the as-deposited and the annealed (500oC, 48 hours) states of the Pr05 case, respectively. Similar to the pure Pt case, agglomeration of Pr05 was also observed after annealing. However, the grain size tended to be smaller compared to Pure Pt case. Unlikely, Pr05 case has increasement in void spaces. This phenomenon can be attributed to the excessively thin PrOx capping layer, which only partially and discontinuously covers the Pt surface [33,34]. As a result, the diffusion of Pt atoms is only partially suppressed, leading to the growth of isolated Pt particles. Consequently, the continuity between particles is weakened, and voids are formed between the grains. According to the previous study by Galinski, oxide interfaces influence the surface energy and diffusion behavior of metal thin films. In particular, it has been reported that a lower adhesion energy at the interface between oxides and metals results in the formation of more void spaces [32].
Furthermore, previous study demonstrated that even trace amounts of oxide present on the surface or at the interface of metal thin films inhibit the free coalescence of particles, leading to the growth of particles in an island-like morphology [35]. In contrast, as shown in Figs. 3(h)-3(j) which correspond to the Pr10, Pr20, and Pr60 cases after annealing at 500oC, a noticeable reduction in void formation can be observed compared to the Pr05 case. This suggests that, as the PrOx capping layer becomes relatively thicker than Pr05, it is able to cover the Pt surface in a more continuous and uniform. The increased thickness of the PrOx layer likely acts as a more effective barrier, suppressing the surface diffusion and movement of Pt particles. Therefore, the tendency for Pt particles to agglomerate and form isolated islands is significantly reduced, and the overall film morphology becomes denser and more cohesive, with fewer voids present between the grains [3]. This observation indicates that the continuity and uniformity of the oxide capping layer play a critical role in controlling the microstructural evolution of the Pt thin film during high-temperature annealing.
To confirm the presence of Pr particles, the Pr60 sample was annealed at 500oC for 48 hours, followed by Energy Dispersive X-ray Spectroscopy (EDS) analysis. The EDS results revealed that the atomic ratio of Pt to Pr was 22.56 at% to 2.88 at%. As shown in Fig. 4, elemental mapping was performed based on the EDS data. These results indicate that PrOx, which contains a high concentration of oxygen vacancies, remains on the surface even after prolonged annealing at 500oC, without being desorbed [23,24].
3.2. Electrochemical Evaluation of LT-SOFCs
Figs. 5(a) shows the j-V-P curves of LT-SOFCs measured at 500oC for each case, and 5(b) shows the comparison of maximum power density of LT-SOFCs. In all cases, the open-circuit voltage (OCV) was above 1.0 V and showed stable state. For Pure Pt without PrOₓ capping layer, the maximum power density was 24.4 mW/cm2, for Pr05 it was 28.3 mW/cm2, for Pr10 it was 31.7 mW/cm2, and for Pr20 it was 38.0 mW/cm2. This shows that PrOₓ capping layer promotes the electrochemical reaction up to 55%. On the other hand, Pr60, which had the thickest PrOₓ capping layer, showed a performance of 35.3 mW/cm2, which is about 7.65% lower than Pr20.
Fig. 6(a) shows the EIS results of Pr20 case, which has highest maximum power density, at OCV, 0.7 V, and 0.5 V. And Fig. 6(b) shows the EIS results of LT-SOFCs measured at 0.7 V. The equivalent circuit at the top of the EIS is composed of resistors (R) and constant phase elements (Q). The EIS is plotted as a Nyquist plot, and the starting point of the small semicircle on the real axis is the ohmic resistance [1,7,8]. Additionally, the arcs of the small and large semicircles correspond to the faradaic resistance. As shown in Table 3, the ohmic resistance of Pure Pt is 4.90 Ω·cm2, which is the largest value of all cases. The ohmic resistance of Pr05 is 4.60 Ω·cm2, showing a 6.12% reduction compared to Pure Pt. Also, Pr10 and Pr20 have values of 4.47 and 3.13 Ω·cm2, respectively, confirming a progressive decrease. This is because PrOx has the property of MIEC, when applied as a capping layer, it can transport both oxygen ions and electrons, enabling charge transfer within the PrOx layer. This expands the charge transfer pathway beyond the Pt cathode-electrolyte interface to include the PrOx layer and the PrOx-Pt boundary, therefore reduces electrical resistance [23,36]. On the other hand, in the case of Pr60, the ohmic resistance increases again to 4.08 Ω·cm2, which is attributed to the fact that although the charge transfer pathways are expanded, the length of the ion transport path becomes much longer than in the other cases [7].
Regarding the faradaic resistance, Pure Pt is 6.37, Pr05 is 4.52, Pr10 is 4.16, Pr20 is 3.87, and Pr60 is 3.42 Ω·cm2. This indicates that as the PrOx capping layer increases, the faradaic resistance decreases. This is because the uniform distribution of PrOx nanoparticles on the cathode surface increases active reaction sites and improves the efficiency of oxygen adsorption and dissociation, resulting in enhancement of the TPBs [37]. Furthermore, PrOx, which is rich in the Pr3+ and Pr4+ redox pair, improves the surface exchange coefficient and accelerates the ORR rate [20-23].
Fig. 7 shows the results of a short-term stability test conducted for 48 hours at a temperature of 500oC under a constant voltage of 0.5 V. The initial current density of Pure Pt was 47.8, Pr05 was 56.4, Pr10 was 62.6, Pr20 was 77.1, and Pr60 was 69.1 mA/cm2. However, after 48 hours, pure Pt decreased to 3 mA/cm2. This is due to the fact that at 500oC, Pt agglomeration occurs, leading to a decrease in TPB and consequently a reduction in reaction sites [16]. Interestingly, Pr05 showed a similar trend to the other PrOx-capped samples, but it sharply decreased to 1 mA/cm2 around 37 hours. SEM analysis notably showed that Pr05 exhibited the highest density of voids among the samples. This suggests that the PrOx layer in Pr05 failed to form a continuous protective film, resulting in insufficient connectivity between Pt particles and an inherently unstable nanostructure. Therefore, the increased interparticle distance, combined with the non-uniformity of the PrOx thin film, leads to the disruption of continuous electronic and ionic transport pathways [38]. This interpretation is reported by previous studies on nanoparticulate thin films, which have shown that increased voids interrupt conductive pathways and significantly degrade electrical properties [38,39]. Pure Pt case undergoes gradual performance degradation due to the diffusion and agglomeration of Pt particles over time, resulting in TPB reduction. In contrast, Pr05 not only experiences TPB reduction similar to Pure Pt but also suffers from agglomeration process irregularities caused by an excessively thin PrOx capping layer. This structural vulnerability leads to an increased void density, destabilizing the connectivity among Pt particles and ultimately causing the blocking of electronic and ionic transport pathways.
On the other hand, for Pr10, Pr20, and Pr60, a steady degradation was observed without a drop in current density. Unlike Pr05, these still allow some flow of oxygen ions and electrons, and partially maintain MIEC. In contrast to the Pr05 case, resulting in a noticeable reduction in voids and the formation of a more continuous and uniform protective coating. This enhanced continuity and increased thickness of the capping layer contribute to greater structural stability, effectively suppressing both Pt agglomeration and the development of voids within the electrode. Consequently, the degradation processes are significantly retarded. These findings underscore that, in order to effectively mitigate degradation, the capping layer must be formed with sufficient thickness and continuity, while minimizing the presence of defects. Only under such conditions can the protective layer serve its intended function and prolong the operational stability of the electrode system. For all cases except Pr05, the degradation rates were 93.7% for Pure Pt, 71.9% for Pr10, 75.9% for Pr20, and 75.5% for Pr60, with Pr10 showing the least degradation rate.
Based on reactive sputtering, we applied a PrOx capping layer to the Pt cathode and analyzed its electrochemical performance. SEM analysis revealed that when the PrOx capping layer is deposited excessively thin, it covers the Pt surface with an unstable structure, leading to the formation of voids. Furthermore, electrochemical measurements in LT-SOFCs demonstrated that the PrOx capping layer functions as a mixed ionic-electronic conductor, expanding ion transport pathways and accelerating ORR kinetics, thereby enhancing cell performance. Among the samples, the Pr20 case exhibited the most outstanding initial performance.
However, despite the enhancement in initial performance, the addition of the PrOx capping layer did not lead to a significant reduction in the performance degradation rate. This suggests that while PrOx improves the initial performance of LT-SOFCs, it is slightly inferior to other ceramic materials in terms of enhancing thermal stability [21,22]. Optimizing the thickness of the PrOx capping layer is key to improving cell performance, but new materials are needed to achieve better thermal stability of LT-SOFCs.

ACKNOWLEDGEMENT

This research was supported by Korean Institute for Advancement of Technology (KIAT) grant funded by the Korea Government (MOTIE) (No. RS-2024-00435841, Human Resource Development Program for Industrial Innovation (Global)). This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (No. RS-2023-00213741).

Fig. 1
Schematic diagram of LT-SOFCs
JKSPE-025-00014f1.jpg
Fig. 2
Schematic diagram of (a) sputtering system and (b) custom-made SOFC test station setup
JKSPE-025-00014f2.jpg
Fig. 3
Surface SEM images of PrOx capping layer with Pt thin films. (a)-(e) As-deposited samples with varying Pr concentrations: (a) Pure Pt, (b) Pr05, (c) Pr10, (d) Pr20, (e) Pr60. (f)-(j) Corresponding samples annealed at 500oC for 48 hours: (f) Pure Pt, (g) Pr05, (h) Pr10, (i) Pr20, (j) Pr60
JKSPE-025-00014f3.jpg
Fig. 4
EDS mapping images of Pr60 film annealed at 500℃ for 48 hours
JKSPE-025-00014f4.jpg
Fig. 5
Performances of LT-SOFCs (a) j-V-P curves and (b) Maximum power densities
JKSPE-025-00014f5.jpg
Fig. 6
EIS results of LT-SOFCs (a) EIS measurements of the Pr20 case at OCV, 0.7V, and 0.5V (b) EIS results at 0.7 V for all cases
JKSPE-025-00014f6.jpg
Fig. 7
Short term stability test of LT-SOFCs at 500℃ (a) current densities at 0.5 V for 48 hours and (b) Comparison of initial and final current densities for 48 hours
JKSPE-025-00014f7.jpg
Table 1
Experimental parameters of electrodes fabrication
Table 1
Parameters Cathode (Pt) Anode (Ni)
Thickness [nm] 150 200
Pressure [mTorr] 50 30
Gas flow [sccm] Ar 30
Deposition power [W] DC 100
Deposition temperature Room temperature
Table 2
Experimental parameters of PrOx capping layer fabrication
Table 2
Parameters Pr05 Pr10 Pr20 Pr60
Pressure [mTorr] 5
Gas flow [sccm] Ar 24 + O2 6
Deposition power [W] RF 40
Deposition temperature Room temperature
Table 3
Ohmic resistance & Faradaic resistance of LT-SOFCs
Table 3
Parameters Pure Pt Pr05 Pr10 Pr20 Pr60
RΩ [Ωcm2] 4.90 4.60 4.47 3.13 4.08
RF [Ωcm2] 6.37 4.52 4.16 3.87 3.42
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Ji Woong Jeon
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M.S. candidate in the Department of Mechanical Engineering, Dankook University. His research interests are fabrication and characterization of solid oxide fuel cells.
Geon Hyeop Kim
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M.S. candidate in the Department of Mechanical Engineering, Dankook University. His research interests are fabrication and characterization of solid oxide fuel cells.
Hyeon Min Lee
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M.S. candidate in the Department of Mechanical Engineering, Dankook University. His research interests are fabrication and characterization of solid oxide fuel cells.
Jun Geon Park
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M.S. candidate in the Department of Mechanical Engineering, Dankook University. His research interests are fuel cells, finite element method, deposition and characterization of thin films.
Gu Young Cho
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Associate Professor in the Department of Mechanical Engineering, Dankook University. His interests are the development of new and renewable energy devices and systems.

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Electrochemical Evaluation of PrOx Capping Layer in LT-SOFCs via Sputtering Process
J. Korean Soc. Precis. Eng.. 2025;42(12):1003-1010.   Published online December 1, 2025
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Electrochemical Evaluation of PrOx Capping Layer in LT-SOFCs via Sputtering Process
J. Korean Soc. Precis. Eng.. 2025;42(12):1003-1010.   Published online December 1, 2025
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Electrochemical Evaluation of PrOx Capping Layer in LT-SOFCs via Sputtering Process
Image Image Image Image Image Image Image
Fig. 1 Schematic diagram of LT-SOFCs
Fig. 2 Schematic diagram of (a) sputtering system and (b) custom-made SOFC test station setup
Fig. 3 Surface SEM images of PrOx capping layer with Pt thin films. (a)-(e) As-deposited samples with varying Pr concentrations: (a) Pure Pt, (b) Pr05, (c) Pr10, (d) Pr20, (e) Pr60. (f)-(j) Corresponding samples annealed at 500oC for 48 hours: (f) Pure Pt, (g) Pr05, (h) Pr10, (i) Pr20, (j) Pr60
Fig. 4 EDS mapping images of Pr60 film annealed at 500℃ for 48 hours
Fig. 5 Performances of LT-SOFCs (a) j-V-P curves and (b) Maximum power densities
Fig. 6 EIS results of LT-SOFCs (a) EIS measurements of the Pr20 case at OCV, 0.7V, and 0.5V (b) EIS results at 0.7 V for all cases
Fig. 7 Short term stability test of LT-SOFCs at 500℃ (a) current densities at 0.5 V for 48 hours and (b) Comparison of initial and final current densities for 48 hours
Electrochemical Evaluation of PrOx Capping Layer in LT-SOFCs via Sputtering Process
Parameters Cathode (Pt) Anode (Ni)
Thickness [nm] 150 200
Pressure [mTorr] 50 30
Gas flow [sccm] Ar 30
Deposition power [W] DC 100
Deposition temperature Room temperature
Parameters Pr05 Pr10 Pr20 Pr60
Pressure [mTorr] 5
Gas flow [sccm] Ar 24 + O2 6
Deposition power [W] RF 40
Deposition temperature Room temperature
Parameters Pure Pt Pr05 Pr10 Pr20 Pr60
RΩ [Ωcm2] 4.90 4.60 4.47 3.13 4.08
RF [Ωcm2] 6.37 4.52 4.16 3.87 3.42
Table 1 Experimental parameters of electrodes fabrication
Table 2 Experimental parameters of PrOx capping layer fabrication
Table 3 Ohmic resistance & Faradaic resistance of LT-SOFCs